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dc.contributor.authorYallew, Henock Demessie
dc.contributor.authorJágerská, Jana
dc.contributor.authorGreve, Martin Møller
dc.date.accessioned2023-02-03T08:17:14Z
dc.date.available2023-02-03T08:17:14Z
dc.date.issued2022-12-06
dc.description.abstractWe use the fixed beam moving stage (FBMS) electron beam lithography technique to pattern a 10 mm long slot waveguide with s-bend tapered double-tip couplers. The fabrication method solves two major limitations of the FBMS mode, namely, the requirement for fixed-width structures and the incidence of stage placement drift for patterns involving elements of different widths. This has been achieved by fracturing the outline of the structure into fixed-width elements of gradually increasing width and creating intermediate overlap areas between the elements to mitigate the stage placement drifts.en_US
dc.identifier.citationYallew HD, Jágerská J, Greve MM. Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography. Journal of Vacuum Science & Technology B. 2022en_US
dc.identifier.cristinIDFRIDAID 2099480
dc.identifier.doi10.1116/6.0002187
dc.identifier.issn1071-1023
dc.identifier.issn1520-8567
dc.identifier.urihttps://hdl.handle.net/10037/28482
dc.language.isoengen_US
dc.publisherAmerican Institute of Physicsen_US
dc.relation.journalJournal of Vacuum Science & Technology B
dc.relation.projectIDinfo:eu-repo/grantAgreement/EC/H2020/758973/Norway/Cryptophane-Enhanced Trace Gas Spectroscopy for On-Chip Methane Detection/sCENT/en_US
dc.rights.accessRightsopenAccessen_US
dc.rights.holderCopyright 2022 The Author(s)en_US
dc.rights.urihttps://creativecommons.org/licenses/by/4.0en_US
dc.rightsAttribution 4.0 International (CC BY 4.0)en_US
dc.titleLong, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithographyen_US
dc.type.versionacceptedVersionen_US
dc.typeJournal articleen_US
dc.typeTidsskriftartikkelen_US
dc.typePeer revieweden_US


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Attribution 4.0 International (CC BY 4.0)
Med mindre det står noe annet, er denne innførselens lisens beskrevet som Attribution 4.0 International (CC BY 4.0)